Nitric acid
Produced with advanced technology, our product quality has reached the domestic leading level.
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Produced with advanced technology, our product quality has reached the domestic leading level. Metal element detection is carried out through advanced testing instruments such as ICP-OES and ICP-MS, which ensures the quality stability. With individual metal impurity of less than 1 ppb, the product is ultra- clean and highly pure with almost no particulate impurities. Its use effect is widely praised by customers. Applications: Wet etching processes in semiconductor IC manufacturing, as well as digestion and dissolution for graphite furnace atomic absorption, ICP-OES, and ICP-MS metal analysis.
Item
Parameter
English name
Nitric Acid
CAS No.
7697-37-2
Molecular formula
HNO3
Molecular weight
63.01
Packaging
500ml
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